| Reticle: |
1. Size 6" square t=0.25"
2. Material Quartz
3. Pattern Material 2 layer Cr, 3 layer Cr
4. Pellicle Frame Pattern Side Only |
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| Wafer: |
1. Size 4” thru 8” SEMI Standard, JEIDA, Notch / Flat |
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| Projection Optics: |
1. Projection Magnification 1/2 X
2 Numerical Aperture 0.24
3. Field Size 50X50mm
4. Exposure Light i-line (365nm) |
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| Illumination: |
1. Light Source 2.0KW Super High Pressure Hg Lamp
2. Intensity 2500 W/m2
3. Uniformity < 1.5%
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| Printing Performance: |
1. Resolution <0.8μm
2. Depth of Focus >4.0μm (0.8μm L&S)
3. Image Field Deviation <2.5μm
4. Distortion <±0.11μm
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| Alignment: |
1. Reticle Rotation Accuracy <±0.02μm on wafer
2. Reticle Rotation Repeatability <0.05μm) on wafer
3. Wafer Alignment <0.10μm mean + 3sigma
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| Focus/Leveling: |
1. Focus Repeatability <0.10μm (3sigma)
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| Leveling: |
1. Leveling Repeatability <7ppm (3sigma)
2. Minimum Compensation Range >100ppm
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| Stage: |
1. Step Accuracy <0.05μm (3sigma)
2. Scaling <±1.0ppm
3. Orthogonality <±1.0ppm
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| Throughput: |
1. >120 wafers/hour Φ6", 50mm, 9 shots
2. >115 wafers/hour Φ8", 50mm, 14 shots
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